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Alumina Wafer Polishing Plate / Turn Table

Quantity:
  • 99.7 Alumina Ceramics
  • Chemshun Ceramics
  • 69091200

 Al2O3 99.7%  Alumina Wafer Polishing Plate / Turn Table 


         99.7% alumina ceramic Carrier Plate Chemshun Ceramics-Alumina Ceramic Carrier3


Application:

As an important component of CMP chemical mechanical polishing process. CMP is the necessary for producing process of the sapphire and Wafer.


Chemshun ceramics-alumina wafer polishling plate


Features :  

- High rigidity (Hardness, Mechanical Strength, Wear Resistance)

- High chemical durability

- Surface shape & roughness control

- Pretty Price

 

Size:

- Disc, ring size below ∅850mm, thickness 45mm.

- For example: D150mm, D360mm,D 600mm.

- Customized products with various size are accepted.


Main Parameter : (Chemical / physical)

Property

Unit

Chemshun Product

Density

g/cm3

         3.94-3.97  

Al2O3

%

 99.7-99.9

Vickers hardness

GPa

≧17

Three-point bending strength

MPa

440-550

Thermal Diffusion Coefficient

Cm2/S

0.0968

Modulus of Elasticity

Gpa

356





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